Lithographic patterning of insulating or semiconducting solid state material in crystalline form
2014
Abstract
A method for lithographic patterning of an insulating or semiconducting solid state material in crystalline form, said method comprising a step where said material is exposed to an amount of radiation which is sufficient to change its insulating or semiconducting state into a conducting state.
Details
Title
Lithographic patterning of insulating or semiconducting solid state material in crystalline form
Author(s)
Moser, Simon Karl ; Moreschini, Luca ; Rotenberg, Eli
Date
2014
Keywords
Other identifier(s)
EPO Family ID: 50000030
Patent number(s)
US2015323864 (A1)
WO2014080367 (A1)
WO2014080367 (A1)
Laboratories
ICMP
Record Appears in
Scientific production and competences > SB - School of Basic Sciences > SB Archives > ICMP - IInstitute of Condensed Matter Physics
Work produced at EPFL
Patents
Work produced at EPFL
Patents
Record creation date
2017-05-24